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fused silica mining process
Plasma-induced atom migration manufacturing of fused silica
In order to effectively reduce the subsurface damage of fused silica optics and obtain an ultra-smooth surface at atomic scale, we proposed a hybrid manufacturing A small rod of fused silica (a welding rod ) is melted locally in order to fill the gap between the two glass components. Once the melt seam is done, or for large parts in multiple Shaping and forming of fused silica Heraeus
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Surface Texture Evolution of Fused Silica in a
Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing by Xing Su 1, Chenglong Ji 1, Yang Xu 1, Duo Li 1,*, David Walker 2,3,4, Abstract Isostatic pressure of 300 MPa promoted the formation of strong bonds between fused silica pieces. The joining was performed using a 5 mol/l NaOH Cold joining of fused silica: Bonding pressure and surface
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A process to fabricate fused silica nanofluidic devices with
A process to fabricate fused silica nanofluidic devices with embedded electrodes using an optimized room temperature bonding technique. Fused silica is an This paper describes about the non-conventional method of polishing technique. A sample of Fused silica glass has been considered and processed using Experimental investigation and machine parameter optimization
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Micro-milling of fused silica based on instantaneous chip thickness
Micro-milling of fused silica based on instantaneous chip thickness Yuan Jin a,Yanshen Wang b,Xiaocheng Zhang b,Bo Wang a Add to Mendeley Silica-based ceramic cores play key roles in the casting of aeroengine blades, but they are highly limited by the poor high-temperature mechanical property. Here, fused mullite (FM) and sintered mullite (SM) powders were modified in silica-based ceramic cores, and the microstructure evolution and crystallization kinetics of ceramic cores Microstructure and Crystallization Kinetics of Silica-Based Ceramic
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Microfluidic Chip Fabrication of Fused Silica Using
Although glass is in high demand as a material for microfluidic chips, it is still difficult to fabricate microstructures on glass. In this paper, polycrystalline diamond tools were fabricated through There are two sets of process families, one where the deposited nano-particles are directly melted to a condensed fused silica layer, and one, where the soot is accumulated and in a secondary process step Making of fused silica Heraeus
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An Analysis of the Effect of Abrasive/Tool Wear on the Ductile
Understanding the influence mechanism of abrasive/tool wear on machining is the key to realize high-efficiency ultra-precision machining of fused silica. To explore the effect of abrasive/tool wear on ductile machining, the smoothed particle hydrodynamics (SPH) cutting models with different edge radii are established. Through Refractories have many varieties and classification methods. According to chemical characteristics, refractories can be divided into (1) acid refractories with silica as the main component; (2) basic refractories with magnesia and calcia as main components; (3) neutral refractories with alumina, chromium trioxide, and carbon as main components.Refractories, Properties and Application of SpringerLink
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Fused quartz
Fused quartz, fused silica or quartz glass is a glass consisting of almost pure silica (silicon dioxide, SiO 2) in amorphous (non- crystalline) form. This differs from all other commercial glasses in which other ingredients are added which change the glasses' optical and physical properties, such as lowering the melt temperature.Fused silica has been produced by gas-phase hydrolysis of a very high purity silicon tetrachloride and fusion of the SiO 2 formed. This synthetic product contains only 1 ppm of impurities. The drawing process is carried out at the melting temperature, which ranges, depending on the composition, between 1700 and 2100°C.Fused Silica an overview ScienceDirect Topics
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Subsurface defects characterization and laser damage
Introduction. Fused silica is the glassy form of quartz and is isotropic. Because of its excellent optical properties, fused silica members have been widely used as the manufacturing material for optics in high power/energy laser systems such as the National Ignition Facility in the United States [1], [2], the Laser MegaJoule in France [3] The continuous downward etching process was accompanied by the continuous removal of the subsurface damage layer. With optimized process parameters, plasma-IEP could efficiently generate a less damage surface of fused silica with a material removal rate of 0.8 μm/min, and reduce the Sa roughness from 97.1 nmTheoretical and experimental study on plasma-induced atom
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Effects of precursors on silica particle generation in CVD synthesis
High purity fused silica glass can be synthesized by CVD process in which silica particles are generated by precursors reacted in H 2 /O 2 flame and deposited on the substrate. Selection of precursors has significant influence on silica particle generation, and further affects particle transport and deposited glass quality.Section snippets Sample preparation. Fused silica samples (JGS1) were obtained from Sikoy Optics & Electron Co. Ltd. with dimensions of 50 mm × 50 mm × 2 mm.Each sample was polished with surface roughness of 0.80 nm (Rq) measured with atomic force microscope (AFM).Since contamination of preceding treatments [8], Optimum inductively coupled plasma etching of fused silica to
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Deep multilevel wet etching of fused silica glass microstructures
The proposed etching process ensures mask stability, high etching rate and isotropy allowing to get multilevel etch profile in fused glass with a one initial photolithography step. 2. Mechanism of a fused silica glass etching in hydrofluoric acid solutions Fused quartz is a pure silica glass (SiO2) in amorphous form.Fused silica has become the preferred optical material in the field of inertial confinement fusion (ICF) due to its excellent performance; however, these costly optical elements are vulnerable, and their manufacture is time-consuming. Therefore, the restoration of laser-induced damage for these optical elements is of great value. To Research on Laser-Induced Damage Post-Restoration Morphology of Fused
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Fused silica : Discover our high purity solutions Elkem
Fused silica is made of very high purity crystal silica (quartz sand), melted by fusion in electrical arc ovens at temperatures of 1800-2000 ℃ and then cooled sufficiently fast to avoid crystallization and obtain transparent amorphous silica (silicon dioxide). Fused silica emerges from this process in large non-crystalline silica glass blocksFused silica is a typical brittle material. However, surface damage (SD) and subsurface damage (SSD) appear unavoidably in the grinding process of brittle materials. The main forms of SD are scratches, micro-pits, texture, or streaks, while SSD mainly includes micro-cracks, dislocations, phase transformation, and residual stress.Models of grinding-induced surface and subsurface damages in fused
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Statistically Correlating Laser-Induced Damage Performance with
Photothermal weak absorption is useful for the diagnosis of absorbing defects on the surface of fused silica optics in high-power lasers. However, how they relate to the laser-induced damage performance remains unclear, especially for a fused silica surface that has been post-treated with different processes (e.g., dynamic chemical In this paper, a form of APPP, inductively coupled plasma (ICP), is used to process fused silica substrates with fluorocarbon precursor under atmospheric pressure. The surface morphology evolution of ICP-processed substrates was observed and characterized by confocal laser scanning microscope (CLSM), field emission scanning Surface roughening of ground fused silica processed by
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Micromachines Free Full-Text Study on the Absorption
As a material with excellent optical properties, fused silica was widely used in the manufacturing process of key optics in high-energy laser systems, such as National Ignition Facility (NIF) in the United States, SG-III laser facility in China and Laser Megajoule system in France, etc. [1,2,3].For these laser systems, their service Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already been demonstrated. However, the FLISE technology still faces severe limitations for a Improvement of Etching Anisotropy in Fused Silica by Double
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Plasma-induced atom migration manufacturing of fused silica
The continuous downward etching process was accompanied by the continuous removal of the subsurface damage layer. With optimized process parameters, plasma-IEP could efficiently generate a less damage surface of fused silica with a material removal rate of 0.8 μm/min, and reduce the Sa roughness from 97.1 nm
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